Double patterning is a class of technologies developed for photolithography to enhance the feature density of computer chips. The resolution of a photoresist pattern begins to blur at around 45 nm ...

TSMC is planning to adopt double patterning extensively at 20nm, despite the high cost of doing so. Why? Because EUV hasn't come through. Share on Facebook (opens in a new window) Share on X (opens in ...

Share and share alike! Our mothers always said it was the right thing to do, and it seems that this ideology is now coming front and center for double patterning at 20nm and below. As we continue to ...

SAN FRANCISCO — Amid probable delays for extreme ultraviolet (EUV) lithography, ASML, Canon and Nikon are updating their roadmaps, racing each other to capitalize on the shift towards ...

Researchers, equipment vendors, and manufacturers alike are watching with growing concern as we creep every closer to the end of 193 nm optical lithography. The problem is not that there are no ...

High‑NA EUV's reduced field size is driving new innovation in optical proximity correction and mask synthesis.

ASML has announced more plans for a new lithography tool of the fut ure, something that will extend design limits for the very highest transistor-density chips. ASML's former president, Martin van den ...

Gigaphoton (Japan) announced a 104 watt Extreme Ultraviolet (EUV) light source which is a critical part for the realization of the first volume-production-worthy EUV light source target for 2011. It ...

Extreme UV lithography (EUVL) and 193 nm immersion lithography enhanced by double-patterning techniques will be sufficient to maintain the lithography roadmap for several technology nodes. That was ...

They’re both years late, but two long-awaited manufacturing changes are finally nearing implementation in the semiconductor industry. One is the processing of much larger silicon wafer disks, which ...

Gigaphoton has released a 90W argon-fluoride excimer laser for use in next-generation semiconductor manufacturing. With a power output of 90 W and a repetition rate of 6000 Hz, the new ArF excimer ...