SCREEN and IBM Sign Agreement for Next-Generation EUV Lithography Cleaning Process Development - Agreement builds on more than a decade of collaboration between the two …

Single Wafer Cleaner SU-3400 The Evolution of the World's No. 1* Cleaning Equipment * Based on SCREEN in-house research

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To address this issue, as a leader in semiconductor production equipment, the SCREEN Group has developed an innovative technology for reducing organic wastewater with the potential to …

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The SS-80EX features the same advanced spin scrubber technology developed by SCREEN over many years while also delivering significantly improved functionality. High-speed processing of …

1. These systems enable half-pitch transfer of wafers. The size of baths has been reduced to minimize the volume of chemicals and DI water used. 2. The CHB chemical circulation bath …

With SCREEN’s over 30-year technical know-how, the system supports advanced immersion ArF lithography, E-Beam and Directed Self-Assembly (DSA) coat / develop / bake track solutions …

1. High Throughput The FC-3100 is capable of achieving a high throughput of 1,000 wafers per hour, which has been realized by incorporating a high throughput buffer module and a high …

1. Highly efficient submission and proofing EQUIOS Online enables data submission and proofing using any device that supports an Internet-connected Web browser from any place at any …